Corrosion behavior of Cu during graphene growth by CVD

被引：48
作者：
Dong, Yuhua [1 ]
Liu, Qingqing [1 ]
Zhou, Qiong [1 ]
机构：
[1] China Univ Petr, Coll Sci, Beijing 102249, Peoples R China
来源：
CORROSION SCIENCE | 2014年 / 89卷
关键词：
Copper; EIS; SEM; COPPER; BARRIER; GRAINS;
D O I：
10.1016/j.corsci.2014.08.026
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The corrosion performance of Cu samples may be affected by annealing at high temperatures during graphene growth via the chemical vapor deposition method. In this study, multiple graphene films were deposited on Cu and characterized by Raman spectroscopy and transmission electron microscopy. The corrosion behavior of Cu immersed in 3.5 wt.% NaCl solution was investigated using electrochemical impedance spectroscopy. The Cu morphology was observed by optical microscopy and scanning electron microscopy. Results indicated that annealing affects the corrosion process of Cu. The presence of graphene films on the Cu substrate improved the corrosion performance of the material for a short period of time. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码：214 / 219
页数：6
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