Detailed Characterization of 2-Heptanone Conversion by Dielectric Barrier Discharge in N2 and N2/O2 Mixtures
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Chiper, Alina Silvia
[2
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Blin-Simiand, Nicole
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Univ Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Blin-Simiand, Nicole
[1
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Heninger, Michel
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Univ Paris 11, AlyXan, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Heninger, Michel
[3
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Mestdagh, Helene
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Univ Paris 11, CNRS, UMR 8000, Chim Phys Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Mestdagh, Helene
[4
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Boissel, Pierre
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Univ Paris 11, AlyXan, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Boissel, Pierre
[3
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Jorand, Francois
[1
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Lemaire, Joel
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Univ Paris 11, CNRS, UMR 8000, Chim Phys Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Lemaire, Joel
[4
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Leprovost, Julien
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Univ Paris 11, AlyXan, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Leprovost, Julien
[3
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Pasquiers, Stephane
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Univ Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Pasquiers, Stephane
[1
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Popa, Gheorghe
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Alexandru Ioan Cuza Univ, Fac Phys, Dept Plasma Phys, Iasi 700506, RomaniaUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Popa, Gheorghe
[2
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Postel, Christian
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Univ Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, FranceUniv Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
Postel, Christian
[1
]
机构:
[1] Univ Paris 11, CNRS, UMR 8578, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
[2] Alexandru Ioan Cuza Univ, Fac Phys, Dept Plasma Phys, Iasi 700506, Romania
[3] Univ Paris 11, AlyXan, F-91405 Orsay, France
[4] Univ Paris 11, CNRS, UMR 8000, Chim Phys Lab, F-91405 Orsay, France
The products of 2-heptanone conversion by dielectric barrier discharge plasma are analyzed under different conditions: alternating current (ac) or pulsed mode of excitation, variable energy, variable composition of the carrier gas. The efficiency of the conversion is higher using a pulse excitation mode than an ac mode. With a small oxygen percentage (about 2-3%) added to nitrogen, 2-heptanone is about 30% more efficiently removed than in pure nitrogen, while the 2-heptanone removal decreases with an oxygen percentage higher than 3%. A new analysis method, based on chemical ionization mass spectrometry, is used for volatile organic compound detection along with chromatography. Several products issued from 2-heptanone conversion with ac excitation are identified in nitrogen and in air, and a chemical scheme is proposed to explain their formation and their treatment by the discharge. It appears that byproducts are issued not only from oxidation reactions, but also from C-C bond cleavage by collisions with electrons or nitrogen excited states.