Effects of surface states on electrical characteristics of InN and In1-xGaxN

被引:63
作者
Yim, J. W. L.
Jones, R. E.
Yu, K. M.
Ager, J. W., III
Walukiewicz, W.
Schaff, William J.
Wu, J. [1 ]
机构
[1] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA
[3] Cornell Univ, Dept Elect & Comp Engn, Ithaca, NY 14853 USA
关键词
D O I
10.1103/PhysRevB.76.041303
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Surface states are known to pin the Fermi level in InN and In1-xGaxN, strongly affecting charge distribution and transport on the surface and at interfaces. By solving Poisson's equation over a range of bias voltages for an electrolyte-based capacitance-voltage measurement configuration, we have calculated the band bending and space charge distribution in this system and developed an electronic model generally applicable to both p- and n-type group-III-nitride thin films. Both conduction band nonparabolicity and band renormalization effects due to the high surface electron concentration were included. The calculated space charge distributions, using the majority dopant concentration as a fitting parameter, are in excellent agreement with experimental data. The model quantitatively describes increasingly strong n-type electrical characteristics on the surface due to electron accumulation in p-type In1-xGaxN for decreasing values of x. This also provides a general understanding of the effect of mobile carriers on capacitance-voltage measurements.
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页数:4
相关论文
共 18 条
[1]   Physics of the resonating valence bond (Pseudogap) state of the doped Mott insulator: Spin-charge locking [J].
Anderson, PW .
PHYSICAL REVIEW LETTERS, 2006, 96 (01)
[2]   Capacitance-voltage profiling and the characterisation of III-V semiconductors using electrolyte barriers [J].
Blood, P .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1986, 1 (01) :7-27
[3]  
Davydov VY, 2002, PHYS STATUS SOLIDI B, V234, P787, DOI 10.1002/1521-3951(200212)234:3<787::AID-PSSB787>3.0.CO
[4]  
2-H
[5]  
Goldberg Yu., 2001, Properties of Advanced Semiconductor Materials: GaN, AIN, InN, BN, SiC, SiGe
[6]   Electrochemical capacitance voltage profiling of the narrow band gap semiconductor InAs [J].
Gopal, V ;
Chen, EH ;
Kvam, EP ;
Woodall, JM .
JOURNAL OF ELECTRONIC MATERIALS, 2000, 29 (11) :1333-1339
[7]   Evidence for p-type doping of InN [J].
Jones, RE ;
Yu, KM ;
Li, SX ;
Walukiewicz, W ;
Ager, JW ;
Haller, EE ;
Lu, H ;
Schaff, WJ .
PHYSICAL REVIEW LETTERS, 2006, 96 (12)
[8]   Variation of band bending at the surface of Mg-doped InGaN:: Evidence of p-type conductivity across the composition range [J].
King, P. D. C. ;
Veal, T. D. ;
Jefferson, P. H. ;
McConville, C. F. ;
Lu, Hai ;
Schaff, W. J. .
PHYSICAL REVIEW B, 2007, 75 (11)
[9]   Origin of electron accumulation at wurtzite InN surfaces -: art. no. 201307 [J].
Mahboob, I ;
Veal, TD ;
Piper, LFJ ;
McConville, CF ;
Lu, H ;
Schaff, WJ ;
Furthmüller, J ;
Bechstedt, F .
PHYSICAL REVIEW B, 2004, 69 (20) :201307-1
[10]   Intrinsic electron accumulation at clean InN surfaces [J].
Mahboob, I ;
Veal, TD ;
McConville, CF ;
Lu, H ;
Schaff, WJ .
PHYSICAL REVIEW LETTERS, 2004, 92 (03) :4