Advances in femtosecond laser processing of optical material for device applications

被引:28
|
作者
Choi, Jiyeon [1 ]
Schwarz, Casey [2 ]
机构
[1] KIMM, Daejeon, South Korea
[2] Ursinus Coll, Collegeville, PA 19426 USA
关键词
GRATING WAVE-GUIDES; FRESNEL ZONE PLATES; FUSED-SILICA; CHALCOGENIDE GLASS; PHOTOSENSITIVE GLASS; THERMAL-STABILITY; PHOTONIC CRYSTALS; MU-M; FABRICATION; WRITTEN;
D O I
10.1111/ijag.14979
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Femtosecond laser induced changes and writing in optical materials have proven to be an excellent route to the production of high-quality micro- and nanofabrication of functional devices. In this paper we present the latest advancements in femtosecond laser processing of optical materials for device applications. We look at femtosecond direct laser writing for photonic device fabrication in fused silica and active glasses. We also discuss femtosecond laser writing and wet chemical etching in fused silica, Foturan, and chalcogenide glasses with applications in microfluidics, optics, sensors, and photonic devices.
引用
收藏
页码:480 / 490
页数:11
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