RHEED in-situ monitored step edge diffusion during interrupted laser ablation epitaxy growth of SrTiO3

被引：0
|
作者：
Wang, TC [1 ]
Lee, JY [1 ]
Hsieh, CC [1 ]
Juang, JY [1 ]
Wu, KH [1 ]
Uen, TM [1 ]
Gou, YS [1 ]
机构：
[1] Natl Chiao Tung Univ, Dept Electrophys, Hsinchu 300, Taiwan
来源：
CHINESE JOURNAL OF PHYSICS | 2004年 / 42卷 / 06期
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D O I：
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中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
A series of investigations on the interrupted deposition of laser ablation strontium titanate epitaxy growth were conducted. RHEED intensity recovery curves at various temperatures show a near-quadratic power law dependence on annealing time. Combined with the evidence showing the intimate correlation between the step edge density and the RHEED intensity, a diffusion Arrhenius plot with the activation energy of 1.0 eV was obtained for the kinetics of step edge migration.
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页码：710 / 716
页数：7
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