RHEED in-situ monitored step edge diffusion during interrupted laser ablation epitaxy growth of SrTiO3

被引：0

作者：

Wang, TC ^{[1
]}

Lee, JY ^{[1
]}

Hsieh, CC ^{[1
]}

Juang, JY ^{[1
]}

Wu, KH ^{[1
]}

Uen, TM ^{[1
]}

Gou, YS ^{[1
]}

机构：

[1] Natl Chiao Tung Univ, Dept Electrophys, Hsinchu 300, Taiwan

来源：

CHINESE JOURNAL OF PHYSICS | 2004年 / 42卷 / 06期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A series of investigations on the interrupted deposition of laser ablation strontium titanate epitaxy growth were conducted. RHEED intensity recovery curves at various temperatures show a near-quadratic power law dependence on annealing time. Combined with the evidence showing the intimate correlation between the step edge density and the RHEED intensity, a diffusion Arrhenius plot with the activation energy of 1.0 eV was obtained for the kinetics of step edge migration.

引用

页码：710 / 716

页数：7

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