Fabrication of sub-micron high aspect ratio diamond structures with nanoimprint lithography

被引：9
|
作者：
Karlsson, M. [1 ]
Vartianen, I. [2 ]
Kuittinen, M. [2 ]
Nikolajeff, F. [1 ]
机构：
[1] Uppsala Univ, Dept Engn Sci, SE-75121 Uppsala, Sweden
[2] Univ Joensuu, Dept Phys & Math, FIN-80101 Joensuu, Finland
来源：
MICROELECTRONIC ENGINEERING | 2010年 / 87卷 / 11期
关键词：
CVD diamond; Nanoimprint lithography; Inductively coupled plasma etching; Nanostructures; INFRARED SPECTRAL REGION; PHASE MASK CORONAGRAPH; CVD DIAMOND; IMPRINT LITHOGRAPHY; SURFACES; MICROOPTICS;
D O I：
10.1016/j.mee.2009.12.085
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Polycrystalline diamond with optical quality has been patterned using nanoimprint lithography. Nanoimprint lithography is a rather new method for fabrication of resist structures with features sizes down to at least 20 nm. The pattern used in this article is a grating with a period of 600 nm and a fill factor of 0.5. Using plasma etching the nanoimprinted grating is etched into a freestanding diamond substrate. We have accomplished the fabrication of 300 nm diamond features with a depth of about 2 mu m, which corresponds to an aspect ratio of 7. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：2077 / 2080
页数：4
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