Fabrication of sub-micron high aspect ratio diamond structures with nanoimprint lithography

被引：9

作者：

Karlsson, M. ^{[1
]}

Vartianen, I. ^{[2
]}

Kuittinen, M. ^{[2
]}

Nikolajeff, F. ^{[1
]}

机构：

[1] Uppsala Univ, Dept Engn Sci, SE-75121 Uppsala, Sweden

[2] Univ Joensuu, Dept Phys & Math, FIN-80101 Joensuu, Finland

来源：

MICROELECTRONIC ENGINEERING | 2010年 / 87卷 / 11期

关键词：

CVD diamond; Nanoimprint lithography; Inductively coupled plasma etching; Nanostructures; INFRARED SPECTRAL REGION; PHASE MASK CORONAGRAPH; CVD DIAMOND; IMPRINT LITHOGRAPHY; SURFACES; MICROOPTICS;

D O I：

10.1016/j.mee.2009.12.085

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Polycrystalline diamond with optical quality has been patterned using nanoimprint lithography. Nanoimprint lithography is a rather new method for fabrication of resist structures with features sizes down to at least 20 nm. The pattern used in this article is a grating with a period of 600 nm and a fill factor of 0.5. Using plasma etching the nanoimprinted grating is etched into a freestanding diamond substrate. We have accomplished the fabrication of 300 nm diamond features with a depth of about 2 mu m, which corresponds to an aspect ratio of 7. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：2077 / 2080

页数：4

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