Photocatalytic Activity Under UV and Solar Illumination of Thin ZnO Films Grown by Atomic Layer Deposition

被引：0

作者：

Jardas, Daria ^{[1
,2
]}

Omerzu, Ales ^{[1
,2
]}

Peter, Robert ^{[1
,2
]}

Piltaver, Ivna Kavre ^{[1
,2
]}

Petravic, Mladen ^{[1
,2
]}

机构：

[1] Univ Rijeka, Fac Phys, Rijeka, Croatia

[2] Univ Rijeka, NANORI, Rijeka, Croatia

来源：

2022 INTERNATIONAL CONGRESS ON ADVANCED MATERIALS SCIENCES AND ENGINEERING, AMSE | 2022年

关键词：

ZnO; thin films; plasma; atomic layer deposition; photocatalysis;

D O I：

10.1109/AMSE51862.2022.10036676

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The photocatalytic activity of thin zinc oxide (ZnO) films grown by atomic layer deposition (ALD) and plasma-enhanced ALD (PEALD) was investigated under UV and simulated solar illumination. Optimal deposition temperatures were chosen for each method (200 degrees C for ALD and 60 degrees C for PEALD). Under UVC light, the PEALD ZnO thin film showed higher photocatalytic activity, while the activity of the ALD film was better under sun-simulating light. At UVA, the results were similar for the two types of thin films. We have shown that the photocatalytic activity depends on both optical properties and crystal structure, with neither of them having a dominant impact.

引用

页码：33 / 36

页数：4

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