Photocatalytic TiO2 thin films synthesized by the post-discharge of an RF atmospheric plasma torch

被引：26

作者：

Collette, Stephanie ^{[1
]}

Hubert, Julie ^{[1
]}

Batan, Abdelkrim ^{[1
]}

Baert, Kitty ^{[2
]}

Raes, Marc ^{[2
]}

Vandendael, Isabelle ^{[2
]}

Daniel, Alain ^{[3
]}

Archambeau, Catherine ^{[3
]}

Terryn, Herman ^{[2
]}

Reniers, Francois ^{[1
]}

机构：

[1] Univ Libre Bruxelles, Serv Chim Analyt & Chim Interfaces CHANI, Blvd Triomphe 2, B-1050 Brussels, Belgium

[2] Vrije Univ Brussel, Dept Electrochem & Surface Engn SURF, Pl Laan 2, B-1050 Brussels, Belgium

[3] CRM Grp Adv Coatings & Construct Solut AC&CS, Quartier Polytech 3, Allee Innovat,1,B57, B-4000 Liege, Belgium

来源：

SURFACE & COATINGS TECHNOLOGY | 2016年 / 289卷

关键词：

Titanium dioxide; Plasma deposition; Atmospheric post-discharge; Photocatalysis; CHEMICAL-VAPOR-DEPOSITION; TITANIUM-DIOXIDE; METHYLENE-BLUE; IN-SITU; DEGRADATION; BIOCOMPATIBILITY; ANATASE; HYDROPHILICITY; ADSORPTION; RUTILE;

D O I：

10.1016/j.surfcoat.2016.01.049

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thin films of titanium oxide (TiO2) are synthesized at room temperature by the post-discharge of an RF atmospheric plasma torch supplied with argon and oxygen. Vapours of titanium tetraisopropoxide (TTIP) precursor are injected in the post-discharge by an argon flow rate bubbling in the liquid precursor. Without any external substrate heating, the coatings are amorphous and characterized by a thin film upon which agglomerates can be observed. The annealing of the coatings at 450 degrees C is efficient to (partially) crystallize the TiO2 since bands characteristic of the TiO2 anatase structure are observed in Raman spectra. The films are super-hydrophilic and present excellent photocatalytic activity; two properties of particular interest for self-cleaning applications. Nevertheless, annealed coating presents a higher photocatalytic activity. (C) 2016 Elsevier B.V. All rights reserved.

引用

页码：172 / 178

页数：7

共 64 条

[1] Kinetic and mechanistic study on the chemical vapor deposition of titanium dioxide thin films by in situ FT-IR using TTIP [J].