Ultralow-dielectric-constant optical thin films built from magnesium oxyfluoride vesicle-like hollow nanoparticles

被引:85
作者
Grosso, David [1 ]
Boissiere, Cederic [1 ]
Sanchez, Clement [1 ]
机构
[1] Univ Paris 06, UMR CNRS 7574, Chim Matiere Condensee Paris, F-75252 Paris 05, France
关键词
Thin films;
D O I
10.1038/nmat1950
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Academic and industrial research groups are currently working to obtain high-quality transparent ultralow-refractive-index and ultralow-dielectric-constant thin films, as they are important for designing smart devices and systems for microoptics and microelectronics (for example, multilayer structures, optical resonators, photonic crystals, Cu interconnects, insulating layers and so on)(1). Here, we report a robust and simple procedure to prepare highly porous and resistant semicrystalline magnesium oxyfluoride thin films through liquid deposition followed by a flash and short thermal treatment. These films are water insensitive, mechanically resistant (E = 1 GPa), exhibit high optical quality and have an ultralow-refractive index (n(700nm) = 1.09) and an ultralow dielectric constant (k(100 kHz) = 1.6) which are required for the above-mentioned applications. Moreover, the process used to prepare these nanomaterials is well suited for industrial production on larger surfaces.
引用
收藏
页码:572 / 575
页数:4
相关论文
共 14 条
[11]  
Matheron M, 2005, STUD SURF SCI CATAL, V156, P327
[12]  
Navamathavan R, 2006, J KOREAN PHYS SOC, V48, P1675
[13]   Sol-gel processing and characterization of alkaline earth and rare-earth fluoride thin films [J].
Tada, M ;
Fujihara, S ;
Kimura, T .
JOURNAL OF MATERIALS RESEARCH, 1999, 14 (04) :1610-1616
[14]   Very low-refractive-index optical thin films consisting of an array of SiO2 nanorods [J].
Xi, JQ ;
Kim, JK ;
Schubert, EF ;
Ye, DX ;
Lu, TM ;
Lin, SY ;
Juneja, JS .
OPTICS LETTERS, 2006, 31 (05) :601-603