Characterization of polyacrylonitrile films grafted onto nickel by ellipsometry, atomic force microscopy and X-ray reflectivity

被引：14
|
作者：
Calberg, C
Mertens, M
Jerome, R
Arys, X
Jonas, AM
Legras, R
机构：
[1] Univ Catholique Louvain, Unite Phys & Chim Hauts Polymeres, B-1348 Louvain, Belgium
[2] Univ Liege, Ctr Educ & Res Macromol, B-4000 Liege, Belgium
来源：
THIN SOLID FILMS | 1997年 / 310卷 / 1-2期
关键词：
electrochemistry; ellipsometry; nickel polymers;
D O I：
10.1016/S0040-6090(97)00406-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The thickness and roughness of polyacrylonitrile films electrografted on a nickel surface have been measured by ellipsometry atomic force microscopy and X-ray reflectivity. From combined ellipsometry and X-ray reflectivity measurements, accurate values for the refractive indices of polyacrylonitrile and nickel have been derived at a 6328-Angstrom wavelength. Dependence of the film thickness on the monomer concentration has been quantified for the first time. Furthermore, the thickness of the polyacrylonitrile (PAN) film is related to the nature of the solvent, depending on whether it is a good solvent for PAN (dimethylformamide; DMF) or not (acetonitrile; ACN). (C) 1997 Elsevier Science S.A.
引用
收藏
页码：148 / 155
页数：8
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