Polymethylmethacrylate (PMMA)/CeO2 hybrid particles for enhanced chemical mechanical polishing performance

被引:75
作者
Chen, Yang [1 ]
Li, Zhina [1 ]
Miao, Naiming [2 ]
机构
[1] Changzhou Univ, Sch Mat Sci & Engn, Changzhou 213164, Jiangsu, Peoples R China
[2] Changzhou Univ, Sch Mech Engn, Changzhou 213016, Jiangsu, Peoples R China
基金
中国国家自然科学基金;
关键词
Hybrid particle; Ceria; Fixed abrasive pad; Chemical mechanical polishing; SHELL ABRASIVE PARTICLES; OXIDE CMP; COMPOSITE; POLYMER; MICROSPHERES; NANOPARTICLES;
D O I
10.1016/j.triboint.2014.10.013
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
The organic/inorganic hybrid particles with polymethylmethacrylate (PMMA) spheres (350-360 nm) as inner cores, and ceria nanoparticles (5-10 nm) as outer shells were synthesized via electrostatic interaction. Chemical mechanical polishing (CMP) tests for silica films showed that the hybrid particles exhibited lower surface roughness, fewer scratches as well as lower topographical variations than those of solid ceria particles and (PMMA+CeO2) mixed particles. The improved CMP behavior might be attributed to the synergetic effect of the PMMA cores and the ceria shells. Furthermore, we discussed the material removal mechanism of hybrids in CMP process based on the proposal that the core/shell composite abrasives might be considered as micro-fixed abrasive pads. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码:211 / 217
页数:7
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