Surface treatments of titanium dental implants for rapid osseointegration

被引:1852
作者
Le Guehennec, L. [1 ]
Soueidan, A. [1 ]
Layrolle, P. [1 ]
Amouriq, Y. [1 ]
机构
[1] Fac Dent Surg, Inserm U791, LIOAD, F-44042 Nanterre, France
关键词
osseointegration; dental implants; surface roughness; nano-sized topography; biomimetic calcium phosphate coating;
D O I
10.1016/j.dental.2006.06.025
中图分类号
R78 [口腔科学];
学科分类号
1003 ;
摘要
The osseointegration rate of titanium dental implants is related to their composition and surface roughness. Rough-surfaced implants favor both bone anchoring and biomechanical stability. Osteoconductive calcium phosphate coatings promote bone healing and apposition, leading to the rapid biological fixation of implants. The different methods used for increasing surface roughness or applying osteoconductive coatings to titanium dental implants are reviewed. Surface treatments, such as titanium plasma-spraying, grit-blasting, acid-etching, anodization or calcium phosphate coatings, and their corresponding surface morphologies and properties are described. Most of these surfaces are commercially available and have proven clinical efficacy (>95% over 5 years). The precise role of surface chemistry and topography on the early events in dental implant osseointegration remain poorly understood. In addition, comparative clinical studies with different implant surfaces are rarely performed. The future of dental implantology should aim to develop surfaces with controlled and standardized topography or chemistry. This approach will be the only way to understand the interactions between proteins, cells and tissues, and implant surfaces. The local release of bone stimulating or resorptive drugs in the peri-implant region may also respond to difficult clinical situations with poor bone quality and quantity These therapeutic strategies should ultimately enhance the osseointegration process of dental implants for their immediate loading and long-term success. (C) 2006 Academy of Dental Materials. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:844 / 854
页数:11
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