Atomic layer deposition of titanium dioxide thin films from tetraethoxytitanium and water

被引：5

作者：

Alekhin, A. P. ^{[1
]}

Lapushkin, G. I. ^{[1
]}

Markeev, A. M. ^{[1
]}

Sigarev, A. A. ^{[1
]}

Toknova, V. F. ^{[1
]}

机构：

[1] Moscow MV Lomonosov State Univ, Moscow Inst Phys & Technol, Moscow, Russia

来源：

JOURNAL OF SURFACE INVESTIGATION-X-RAY SYNCHROTRON AND NEUTRON TECHNIQUES | 2010年 / 4卷 / 03期

关键词：

THEORETICAL-MODEL; GROWTH; CYCLE;

D O I：

10.1134/S1027451010030043

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The structure and chemical composition of the titanium dioxide thin films formed by atomiclayer deposition (ALD) from tetraethoxytitanium and water precursors were studied by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, grazing incidence X-ray diffraction, Fourier transform infrared spectroscopy, and atomic force microscopy. The deposited films were demonstrated to have good stoichiometry and anatase type polycrystalline structure. The growth per cycle of titanium dioxide was calculated by an ALD model taking into account the sizes and number of ligands in reactant molecules.

引用

页码：379 / 383

页数：5

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