Nitrogen dissociation in N2-Ar microwave plasmas

被引：15
|
作者：
Henriques, J [1 ]
Tatarova, E [1 ]
Guerra, V [1 ]
Ferreira, CM [1 ]
机构：
[1] Univ Tecn Lisboa, Ctr Fis Plasmas, Inst Super Tecn, P-1049001 Lisbon, Portugal
来源：
VACUUM | 2002年 / 69卷 / 1-3期
关键词：
nitrogen; argon; atoms; dissociation; modelling;
D O I：
10.1016/S0042-207X(02)00328-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The dissociation degree of nitrogen molecules in a wave-driven N-2-Ar discharge operating at microwave frequency (2.45 GHz) is investigated by means of a theoretical model accounting in a consistent way for the main discharge balances and the wave electrodynamics. The enhancement of N-2 dissociation degree at high At percentage in the mixture is pointed out. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：177 / 181
页数：5
相关论文
共 50 条
  • [1] Microwave N2-Ar plasmas applied for N-graphene post synthesis
    Bundaleska, N.
    Bundaleski, N.
    Dias, A.
    Dias, F. M.
    Abrashev, M.
    Filipic, G.
    Cvelbar, U.
    Rakocevic, Z.
    Kissovski, Zh
    Henriques, J.
    Tatarova, E.
    MATERIALS RESEARCH EXPRESS, 2018, 5 (09):
  • [2] Microwave N2-Ar Plasma Torch
    Henriques, J.
    Tatarova, E.
    Dias, F. M.
    Ferreira, C. M.
    4TH INTERNATIONAL WORKSHOP & SUMMER SCHOOL ON PLASMA PHYSICS 2010, 2014, 516
  • [3] Dissociation fraction in low-pressure inductively coupled N2-Ar and O2-Ar plasmas
    Lee, Young Wook
    Lee, Hye-lan
    Chung, T. H.
    CURRENT APPLIED PHYSICS, 2011, 11 (05) : S187 - S191
  • [4] Production of N-graphene by microwave N2-Ar plasma
    Dias, A.
    Bundaleski, N.
    Tatarova, E.
    Dias, F. M.
    Abrashev, M.
    Cvelbar, U.
    Teodoro, O. M. N. D.
    Henriques, J.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (05)
  • [5] Large-scale Ar and N2-Ar microwave plasma sources
    Tatarova, E.
    Dias, F. M.
    Henriques, J.
    Ferreira, C. M.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (13) : 2747 - 2753
  • [6] Pressure dependence of dissociation fraction and optical emission characteristics in low-pressure inductively coupled N2-Ar plasmas
    Chung, T. H.
    Lee, Y. W.
    Joh, H. M.
    Song, M. A.
    AIP ADVANCES, 2011, 1 (03)
  • [7] Microwave N2-Ar plasma torch. I. Modeling
    Henriques, J.
    Tatarova, E.
    Ferreira, C. M.
    JOURNAL OF APPLIED PHYSICS, 2011, 109 (02)
  • [8] Characteristic Investigation of an Atmospheric-Pressure Microwave N2-Ar Plasma Torch
    Li, Shou-Zhe
    Chen, Chuan-Jie
    Zhang, Jialiang
    Wang, Yong-Xing
    Li, Hongda
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2015, 43 (05) : 1683 - 1687
  • [9] Spatial structure of a slot-antenna excited microwave N2-Ar plasma source
    Henriques, J.
    Tatarova, E.
    Dias, F. M.
    Ferreira, C. M.
    JOURNAL OF APPLIED PHYSICS, 2008, 103 (10)
  • [10] Microwave N2-Ar plasma torch. II. Experiment and comparison with theory
    Henriques, J.
    Tatarova, E.
    Dias, F. M.
    Ferreira, C. M.
    JOURNAL OF APPLIED PHYSICS, 2011, 109 (02)
12345