Influence of seed layers on the reflectance of sputtered aluminum thin films

被引:15
|
作者
Schmitt, Paul [1 ,2 ]
Stempfhuber, Sven [1 ,2 ]
Felde, Nadja [1 ]
Szeghalmi, Adriana, V [1 ,2 ]
Kaiser, Norbert [1 ]
Tuennermann, Andreas [1 ,2 ]
Schwinde, Stefan [1 ]
机构
[1] Fraunhofer Inst Appl Opt & Precis Engn IOF, Ctr Excellence Photon, Albert Einstein Str 7, D-07745 Jena, Germany
[2] Friedrich Schiller Univ Jena, Inst Appl Phys IAP, Albert Einstein Str 15, D-07745 Jena, Germany
关键词
OPTICAL-PROPERTIES; ULTRAVIOLET; MIRRORS; COATINGS; OXYGEN;
D O I
10.1364/OE.428343
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The fabrication of highly reflective aluminum coatings is still an important part of current research due to their high intrinsic reflectivity in a broad spectral range. By using thin seed layers of Cu, CuOx, Cr, CrOx, Au, and Ag, the morphology of sputtered (unprotected) aluminum layers and, consequently, their reflectance can be influenced. In this long-term study, the reflectance behavior was measured continuously using spectrophotometry. Particular seed layer materials enhance the reflectance of aluminum coatings significantly and reduce their long-term degradation. Combining such seed layers with evaporation processes and suitable protective layers could further increase the reflectance of aluminum coatings. (C) 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
引用
收藏
页码:19472 / 19485
页数:14
相关论文
共 50 条
  • [21] Influence of the aluminum incorporation on the properties of electrodeposited ZnO thin films
    El Hichou, Ahmed
    Diliberto, Sebastien
    Stein, Nicolas
    SURFACE & COATINGS TECHNOLOGY, 2015, 270 : 236 - 242
  • [22] Influence of power and temperature on properties of sputtered AZO films
    Patel, Kartik H.
    Rawal, Sushant K.
    THIN SOLID FILMS, 2016, 620 : 182 - 187
  • [23] Growth, structure and properties of sputtered niobium oxide thin films
    Foroughi-Abari, Ali
    Cadien, Kenneth C.
    THIN SOLID FILMS, 2011, 519 (10) : 3068 - 3073
  • [24] Influence of evaporation rate and chamber pressure on the FUV reflectance and physical characteristics of aluminum films
    Quijada, Manuel A.
    Del Hoyo, Javier
    Gray, Emrold
    Richardson, J. Grabriel
    Howe, Andrew
    de Marcos, Luis Rodriguez
    Sheikh, David
    UV/OPTICAL/IR SPACE TELESCOPES AND INSTRUMENTS: INNOVATIVE TECHNOLOGIES AND CONCEPTS X, 2021, 11819
  • [25] Effects of substrate temperature on the properties of sputtered TiN thin films
    Ghobadi, Nader
    Ganji, Mohsen
    Luna, Carlos
    Arman, Ali
    Ahmadpourian, Azin
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2016, 27 (03) : 2800 - 2808
  • [26] Nanostructure evolution of magnetron sputtered hydrogenated silicon thin films
    Adhikari, Dipendra
    Junda, Maxwell M.
    Marsillac, Sylvain X.
    Collins, Robert W.
    Podraza, Nikolas J.
    JOURNAL OF APPLIED PHYSICS, 2017, 122 (07)
  • [27] Reflectance changes of Fe and Cr doped Ag thin films deposited by magnetron sputtering
    Loka, Chadrasekhar
    Lee, Kee-Sun
    THIN SOLID FILMS, 2017, 641 : 73 - 78
  • [28] Influence of nitrogen partial pressure on optical properties of magnetron sputtered Al-Si-N thin films
    Soni
    Mishra, S. K.
    Sharma, S. K.
    THIN SOLID FILMS, 2019, 682 : 1 - 9
  • [29] Influence of deposition angle on the structural, morphological and optical properties of sputtered AIN thin films
    Ravankhah, Mahbobeh
    Savaloni, Hadi
    OPTIK, 2017, 132 : 364 - 374
  • [30] Influence of seeding layers and PbO cover-layers on the orientation and microstructure of PLZT thin films
    Lee, JH
    Park, BO
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2003, 100 (03): : 215 - 220