Soft magnetic properties and damping parameter of (FeCo)-Al alloy thin films

被引:14
|
作者
Kanada, Isao [1 ,2 ]
Cruce, Alex [1 ,3 ]
Mewes, Tim [1 ,3 ]
Wu, Shuang [1 ,3 ]
Mewes, Claudia [1 ,3 ]
Mankey, Gary [1 ,3 ]
Suzuki, Takao [1 ,4 ,5 ]
机构
[1] Univ Alabama, Ctr Mat Informat Technol MINT, Tuscaloosa, AL 35487 USA
[2] TDK Corp, Mat Dev Ctr, Chiba 2868588, Japan
[3] Univ Alabama, Dept Phys & Astron, Tuscaloosa, AL 35487 USA
[4] Univ Alabama, Dept Met & Mat Engn, Tuscaloosa, AL 35487 USA
[5] Univ Alabama, Dept Elect & Comp Engn, Tuscaloosa, AL 35487 USA
关键词
D O I
10.1063/1.4975995
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
For high frequency device applications, a systematic study of the soft magnetic properties and magnetization dynamics of (FeCo)-Al alloy thin films has been carried out. A low effective damping parameter alpha(eff) of 0.002 and a high saturation magnetization of about 1,800 emu/cc are obtained at y=0.2 similar to 0.3 for (Fe1-yCoy)(98)Al-2 alloy thin films deposited onto fused silica and MgO(100) at an ambient temperature during deposition. Those films are of the bcc structure with the <110> orientation normal to the film plane. They possess a columnar structure, grown along the film normal. The column width is found to be about 20 nm for y=0.25. It is concluded that the (FeCo)-Al thin films with a damping parameter as low as 0.002 and high saturation magnetization of about 1,800 emu/cc have been successfully fabricated, and that they are potential for future high frequency device applications. (C) 2017 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
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页数:7
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