Metal alloy and monoelemental nanoclusters in silica formed by sequential ion implantation and annealing in selected atmosphere

被引:5
作者
Ren, F
Jiang, CZ [1 ]
Chen, HB
Shi, Y
Liu, C
Wang, JB
机构
[1] Wuhan Univ, Dept Phys, Wuhan 430072, Peoples R China
[2] Wuhan Univ, Ctr Electron Microscopy, Wuhan 430072, Peoples R China
[3] Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
ion implantation; nanocluster composites; alloy; annealing;
D O I
10.1016/j.physb.2004.09.005
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The preparation of metal alloy and monoelemental nanoclusters in silica by Ag, Cu ion sequential implantation and annealing in selected oxidizing or reducing atmosphere is studied. The formation of metastable Ag-Cu alloy is verified in the as-implanted samples by optical absorption spectra, selected area electron diffraction and energy dispersive spectrometer spectrum. The alloy is discomposed at elevated annealing temperature in both oxidizing and reducing atmospheres. The different effects of annealing behaviors on the Ag Cu alloy nanoclusters are investigated. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:92 / 97
页数:6
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