Study of IGBTs Reliability Under Coupled Electrical-Thermal Environment

被引:11
|
作者
Meng, Heli [1 ]
Wang, Yanhao [1 ]
Zheng, Xiahui [1 ]
Chen, Jie [1 ]
Wu, Yuxuan [1 ]
Li, Anqi [1 ]
Huang, Yongzhang [1 ]
机构
[1] North China Elect Power Univ, State Key Lab Alternate Elect Power Syst Renewabl, Beijing 102206, Peoples R China
关键词
Stress; Degradation; Temperature measurement; Insulated gate bipolar transistors; Reliability; Logic gates; Current measurement; Bonding wire; degradation mechanisms; IGBT; reliability experiment; residual stress; THRESHOLD-VOLTAGE INSTABILITY; GATE-OXIDE; POWER; DEGRADATION; DEPENDENCE; INTERFACE; FAILURES; MODELS; CHIP;
D O I
10.1109/JESTPE.2020.2988847
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electric field and temperature are two of the most important factors affecting the reliability of IGBT devices. However, the actual effects of coupled electrical-thermal stress on the reliability of these devices have not been studied in detail. In this article, cross-experiments combining different types of reliability experiments, such as high-temperature gate bias, high-temperature storage stressing, and power cycling (PC), are carried out to study the degradation mechanisms in the IGBT devices under coupled electrical-thermal stress. The process of cross-experiments is discussed in detail and a large number of IGBT devices are used for experimental verification. The degradation parameters are monitored and the related mechanisms are discussed for two parts: chip and packaging. Based on the experimental results, a detailed trap formation hypothesis about gate leakage current is proposed. At last, it is qualitatively verified via a finite element model that high-temperature storage helps to release residual stress in bonding wires, and the influence of gate oxide degradation in the PC experiments is explained.
引用
收藏
页码:4260 / 4268
页数:9
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