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Quantum metrology matrix
被引:22
|作者:
Yuan, Haidong
[1
]
Fung, Chi-Hang Fred
[2
]
机构:
[1] Chinese Univ Hong Kong, Dept Mech & Automat Engn, Shatin, Hong Kong, Peoples R China
[2] Huawei Technol Dusseldorf GmbH, German Res Ctr, D-80992 Dusseldorf, Germany
关键词:
STATISTICAL DISTANCE;
LIMIT;
D O I:
10.1103/PhysRevA.96.012310
中图分类号:
O43 [光学];
学科分类号:
070207 ;
0803 ;
摘要:
Various strategies exist in quantum metrology, such as with or without ancillary system, with a fixed or optimized measurement, with or without monitoring the environment, etc. Different set of tools are usually needed for different strategies. In this article, we provide a unified framework for these different settings, in particular we introduce a quantum metrology matrix and show that the precision limits of different settings can all be obtained from the trace or the trace norm of the quantum metrology matrix. Furthermore, the probe state enters into the quantum metrology matrix linearly, which makes the identification of the optimal probe states, one of the main quests in quantum metrology, much more efficient than conventional methods.
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页数:8
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