Fabrication of Sputtered Low-strain, Low-loss SiN Waveguide for Optical Phased Array Device

被引：0

作者：

Nishimura, Masaki ^{[1
]}

Takemura, Hayato ^{[1
]}

Umezawa, Toshimasa ^{[2
]}

Yamwong, Wittawat ^{[3
]}

Kawanishi, Tetsuya ^{[1
]}

Yamamoto, Naokatsu ^{[2
]}

Klunngien, Nipapan ^{[3
]}

机构：

[1] Waseda Univ, Sch Fundamental Sci & Engn, Dept Elect & Phys Syst, Tokyo, Japan

[2] Natl Inst Informat & Commun Technol, Network Syst Res Inst, Tokyo, Japan

[3] Natl Elect & Comp Technol Ctr, Thai Microelect Ctr, Bangkok, Thailand

来源：

2020 OPTO-ELECTRONICS AND COMMUNICATIONS CONFERENCE (OECC 2020) | 2020年

关键词：

SiN; sputtering; stress-free; optical phased array; HIGH-CONFINEMENT; NITRIDE;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We fabricated sputtered SiN-waveguides with film stress-free, low-loss waveguide at room temperature for optical phased array devices. The beam steering performance was also estimated using the sputtered thick SiN waveguide.

引用

页数：3

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