Surface studies of chemically vapour deposited silicon films using scanning force microscopy

被引：0

作者：

Flueraru, C ^{[1
]}

Cobianu, C ^{[1
]}

Cosmin, P ^{[1
]}

Dascalu, D ^{[1
]}

机构：

[1] Inst Microtechnol, Bucharest 72225, Romania

来源：

SURFACE DIFFUSION: ATOMISTIC AND COLLECTIVE PROCESSES | 1997年 / 360卷

关键词：

D O I：

暂无

中图分类号：

O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];

学科分类号：

070203 ; 070304 ; 081704 ; 1406 ;

摘要：

A new method for surface diffusion characterization is presented. The measurements conditions for roughness were analysed and the importance of the applied force was proven. The quantitative measurements of friction force versus applied force are presented. The connection between the average friction coefficient and the roughness surface was experimentally demonstrated.

引用

页码：695 / 702

页数：8