Surface dissolution and diffusion of oxygen molecules in SiO2 glass

被引:46
作者
Kajihara, K
Miura, T
Kamioka, H
Hirano, M
Skuja, L
Hosono, H
机构
[1] Japan Sci & Technol Agcy, ERATO, Transparent Electroact Mat Project, Takatsu Ku, Kawasaki, Kanagawa 2130012, Japan
[2] RIKEN, Solid State Opt Sci Res Unit, Wako, Saitama 3510198, Japan
[3] Latvian State Univ, Inst Solid State Phys, LV-1063 Riga, Latvia
[4] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
SiO2; glass; interstitial oxygen molecule; surface dissolution; diffusion; photoluminescence;
D O I
10.2109/jcersj.112.559
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Surface dissolution and diffusion of oxygen molecules (O-2) in SiO2 glass were studied by their photoluminescence at 1272 nm excited with a titanium sapphire laser oscillating at 765 nm. The dissolution Of O-2 from ambient atmosphere at both surfaces was much faster than the following diffusion Of O-2 into SiO2 glass, indicating that the surface dissolution is not the rate-limiting step for the saturation Of SiO2 glass with O-2. The time- and temperature-dependent concentration changes Of O-2 allow to evaluate the diffusion coefficient and the saturation solubility Of O-2 in SiO2 glass.
引用
收藏
页码:559 / 562
页数:4
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