Navolak-diazonaphthoquinone resists: The central role of phenolic strings

被引:10
作者
Reiser, A [1 ]
Yan, ZL [1 ]
Han, YK [1 ]
Kim, MS [1 ]
机构
[1] Polytech Univ, Inst Imaging Sci, Brooklyn, NY 11201 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 03期
关键词
D O I
10.1116/1.591376
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Novolak-diazonaphthoquinone resists are the principal pattern transfer materials of the semiconductor industry, essential tools in building the devices that are making computers possible. In spite of this, there was never a clear understanding of the way Novolak-diazoquinone resists work. In an earlier review [A. Reiser ct al., Angew Chem. Int. Ed. Engl. 35, 2428 (1996)] we had presented experiments and ideas that went a long way toward an interpretation of their functional mechanism, yet we had failed in one important respect: we had not recognized the pivotal role of phenolic strings ill these systems. Since then we have gained a better understanding of the dissolution process;, and the new insights have illuminated and connected seemingly distant phenomena. A coherent and self-consistent picture of dissolution inhibition has emerged. We would like to present it in this article. (C) 2000 American Vacuum Society. [S0734-211X(00)06303-4].
引用
收藏
页码:1288 / 1293
页数:6
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