Enhanced mechanical properties of HfO2 film by nitrogen doping

被引：6

作者：

Lei, P. ^{[1
]}

Guo, S. ^{[1
]}

Zhu, J. ^{[1
]}

Dai, B. ^{[1
]}

Liu, G. ^{[2
]}

Wang, Y. ^{[3
]}

Han, J. ^{[1
]}

机构：

[1] Harbin Inst Technol, Ctr Composite Mat, Harbin 150006, Peoples R China

[2] Ctr High Pressure Sci & Technol Adv Res, Shanghai 201203, Peoples R China

[3] China Acad Engn Phys, Inst Elect Engn, Mianyang 621999, Peoples R China

来源：

SURFACE ENGINEERING | 2016年 / 32卷 / 08期

基金：

中国国家自然科学基金;

关键词：

Hafnium oxynitride film; Magnetron sputtering; Stress; Nitrogen doping; Hardness; THIN-FILMS; PREFERRED ORIENTATION; THERMAL-STABILITY; FIELD-EMISSION; TRANSITION; OXIDATION; STRESS; OXIDE;

D O I：

10.1080/02670844.2015.1121342

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The chemical composition, structure and mechanical properties of hafnium oxide films with different nitrogen constituents were investigated. X-ray photoelectron spectrum analysis showed that nitrogen atoms acted as oxygen substitution and interstitial atoms. The crystalline features exhibited no change during nitrogen doping. Nevertheless, the films with high compressive stress displayed significantly enhanced mechanical properties. The enhanced mechanism could mainly be attributed to the dislocation obstacle motion by inserting nitrogen atoms.

引用

页码：585 / 588

页数：4

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