Influence of Increasing Deposition Temperature on Opto-Electrical Properties of Amorphous Carbon Thin Film

被引：0

作者：

Hussin, Hanim ^{[1
]}

Zakaria, Muhammad Bazli ^{[1
]}

Mohamad, Fakardellawarni ^{[1
]}

Rusop, Mohamad ^{[1
]}

Muhamad, Maizan ^{[1
]}

机构：

[1] Univ Teknol MARA, Fac Elect Engn, Shah Alam 40450, Selangor, Malaysia

来源：

2009 IEEE STUDENT CONFERENCE ON RESEARCH AND DEVELOPMENT: SCORED 2009, PROCEEDINGS | 2009年

关键词：

Amorphous carbon; camphor oil; thin films; thermal CVD;

D O I：

10.1109/SCORED.2009.5443025

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Amorphous carbon (a- C) thin films were deposited on silicon ( Si) substrate by pyrolysing camphor oil at various temperatures with thermal chemical vapor deposition (CVD) technique. The deposited a- C thin films were characterized by Current-Voltage (I- V) Measurement and UV-VIS-NIR Spectrophotometer. The electrical and optical properties of these films have been studied. It was found that increasing deposition temperature had influence on the a- C thin films properties. In addition the carrier gas flow showed a secondary impact on the properties of a- C thin films. The resistivity of a- C thin films decreases when the deposition temperature increases. However, at higher deposition temperature the conductivity increases due to the formation of more disorder sp(2) carbon site.

引用

页码：276 / 279

页数：4

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