New approach to nanocomposites of polyimides containing polyhedral oligomeric silsesquioxane for dielectric applications

被引：81

作者：

Chen, YW

Kang, ET

机构：

[1] Nanchang Univ, Sch Mat Sci & Engn, Nanchang 330047, Peoples R China

[2] Natl Univ Singapore, Dept Chem Engn, Singapore 119260, Singapore

来源：

MATERIALS LETTERS | 2004年 / 58卷 / 29期

关键词：

dielectrics; nanocomposites; POSS; graft polymerization; polyimide;

D O I：

10.1016/j.matlet.2004.08.001

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Low dielectric constant nanocomposites of polyintides with grafted methacrylate side chains containing polyhedral oligomeric silsesquioxane (POSS) were successfully synthesized by thermally initiated free-radical graft copolymerization of methacrylcyclopentyl-POSS (MA-POSS) with the ozone-preactivated poly(arnic acid), followed by thermal imidization. The dielectric constant of the film can be tuned by varying the molar ratio of the grafted MA-POSS side chains in the copolymer. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：3716 / 3719

页数：4