Inkjet printed graphene-based chemi-resistors for gas detection in environmental conditions
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Ricciardella, Filiberto
[1
,2
]
Alfano, Brigida
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机构:
ENEA UTTP, Res Ctr Portici, I-80055 Naples, ItalyENEA UTTP, Res Ctr Portici, I-80055 Naples, Italy
Alfano, Brigida
[1
]
Loffredo, Fausta
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ENEA UTTP, Res Ctr Portici, I-80055 Naples, ItalyENEA UTTP, Res Ctr Portici, I-80055 Naples, Italy
Loffredo, Fausta
[1
]
Villani, Fulvia
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ENEA UTTP, Res Ctr Portici, I-80055 Naples, ItalyENEA UTTP, Res Ctr Portici, I-80055 Naples, Italy
Villani, Fulvia
[1
]
Polichetti, Tiziana
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ENEA UTTP, Res Ctr Portici, I-80055 Naples, ItalyENEA UTTP, Res Ctr Portici, I-80055 Naples, Italy
Polichetti, Tiziana
[1
]
Miglietta, Maria Lucia
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ENEA UTTP, Res Ctr Portici, I-80055 Naples, ItalyENEA UTTP, Res Ctr Portici, I-80055 Naples, Italy
Miglietta, Maria Lucia
[1
]
Massera, Ettore
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ENEA UTTP, Res Ctr Portici, I-80055 Naples, ItalyENEA UTTP, Res Ctr Portici, I-80055 Naples, Italy
Massera, Ettore
[1
]
Di Francia, Girolamo
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ENEA UTTP, Res Ctr Portici, I-80055 Naples, ItalyENEA UTTP, Res Ctr Portici, I-80055 Naples, Italy
Di Francia, Girolamo
[1
]
机构:
[1] ENEA UTTP, Res Ctr Portici, I-80055 Naples, Italy
[2] Univ Naples Federico II, Dept Phys, I-80126 Naples, Italy
来源:
2015 18TH AISEM ANNUAL CONFERENCE
|
2015年
关键词:
Graphene;
ink-jet printing;
gas sensors;
environmental conditions;
SENSORS;
D O I:
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中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
In this work, we report on the inkjet printing as potential technology to manufacture chemi-resistors based on liquid phase exfoliated graphene. With respect to the conventional solution-processable methods, the main IJP capability is related to the deposition of small ink volumes that entails a more controlled drying process. This specific potentiality of the IJP technique were exploited in order to investigate the reproducibility of the device performances upon NO2 and NH3 exposure and operating in environmental conditions.
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Schedin, F.
Geim, A. K.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Geim, A. K.
Morozov, S. V.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Morozov, S. V.
Hill, E. W.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Hill, E. W.
Blake, P.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Blake, P.
Katsnelson, M. I.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Katsnelson, M. I.
Novoselov, K. S.
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Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Schedin, F.
Geim, A. K.
论文数: 0引用数: 0
h-index: 0
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Geim, A. K.
Morozov, S. V.
论文数: 0引用数: 0
h-index: 0
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Morozov, S. V.
Hill, E. W.
论文数: 0引用数: 0
h-index: 0
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Hill, E. W.
Blake, P.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Blake, P.
Katsnelson, M. I.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Katsnelson, M. I.
Novoselov, K. S.
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机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England