Intrinsic performance of carbon-nanotube transistors

被引:0
|
作者
Nihey, F [1 ]
Hongo, H [1 ]
Ochiai, Y [1 ]
Yudasaka, M [1 ]
Iijima, S [1 ]
机构
[1] NEC Corp Ltd, Fundamental Res Labs, Tsukuba, Ibaraki 3058501, Japan
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Intrinsic transconductance of carbon-nanotube field-effect transistors (CNTFETs) was investigated with carbon nanotubes (CNTs) grown both by laser ablation and chemical vapor deposition (CVD). The measured transconductance at a drain voltage of -1 V was 8.7 mu S for a CVD-grown CNT with a diameter of 1.5 nm. Very high intrinsic transconductance of 20 mu S was calculated by considering the contribution of parasitic resistance. Apparent and intrinsic transconductance per unit channel width are considerably larger than those for the state-of-the-art Si-MOSFETs. We expect that the performance of CNTFETs will advance further by improving CNT quality and by optimising device structures.
引用
收藏
页码:619 / 623
页数:5
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