Structural regulation and polishing performance of dendritic mesoporous silica (D-mSiO2) supported with samarium-doped cerium oxide composites

被引:17
作者
Chen, Yang [1 ]
Wang, Menghan [1 ]
Cai, Wenjie [1 ]
Wang, Tianyu [2 ]
Chen, Ailian [2 ]
机构
[1] Changzhou Univ, Sch Mat Sci & Engn, Changzhou 213164, Jiangsu, Peoples R China
[2] Changzhou Univ, Sch Mech Engn, Changzhou 213164, Jiangsu, Peoples R China
基金
中国国家自然科学基金;
关键词
Sm-doped ceria; Core/shell composites; Particle abrasives; Surface chemistry; Chemical mechanical polishing; HIGH-EFFICIENCY; ELASTIC-MODULI; ABRASIVES; PARTICLES; NANOPARTICLES; CMP; OXYGEN; SIZE; INTERFACE; CATALYSTS;
D O I
10.1016/j.apt.2022.103595
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Ceria (CeO2) particles are prevalent polishing abrasive materials. Trivalent lanthanide ions are the popular category of dopants for enriched surface defects and thus improved physicochemical properties, since they are highly compatible with CeO2 lattices. Herein, a series of dendritic-like mesoporous silica (D-mSiO(2))-supported samarium (Sm)-doped CeO2 nanocrystals were synthesized via a facile chemical precipitation method. The relation of the structural characteristics and chemical mechanical polishing (CMP) performances were investigated to explore the effect of Sm-doping amounts on the D-mSiO(2)/SmxCe1-xO2-delta (x = 0-1) composite abrasives. The involved low-modulus D-mSiO(2) cores aimed to eliminate surface scratch and damage, resulting from the optimized contact behavior between abrasives and surfaces. The trivalent cerium (Ce3+) and oxygen vacancy (V-O) at CeO2 surfaces were expected to be reactive sites for the material removal process over SiO2 films. The optimal oxide-CMP performances in terms of removal efficiency and surface quality were achieved by the 40% Sm-doped composite abrasives. It might be attributed to the high Ce3+ and V-O concentrations and the enhancement of tribochemical reactivity between CeO2-SiO2 interfaces. Furthermore, the relationship between the surface chemistry, polishing performance as well as the actual role in oxide-CMP of the D-mSiO(2)/SmxCe1-xO2-delta abrasives were also discussed. (C) 2022 The Society of Powder Technology Japan. Published by Elsevier BV and The Society of Powder Technology Japan. All rights reserved.
引用
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页数:13
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