On the correlation between surface roughness and work function in copper

被引：126

作者：

Li, W ^{[1
]}

Li, DY

机构：

[1] Changchun Univ, Dept Mech Engn, Jilin 130022, Peoples R China

[2] Univ Alberta, Dept Mech Engn, Edmonton, AB T6G 2G8, Canada

[3] Univ Alberta, Dept Chem & Mat Engn, Edmonton, AB T6G 2G6, Canada

来源：

JOURNAL OF CHEMICAL PHYSICS | 2005年 / 122卷 / 06期

关键词：

D O I：

10.1063/1.1849135

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Both surface roughness (SR) and work function (WF) are important characteristics of a solid surface. Understanding the relationship between SR and WF is necessary in order to apply the Kelvin probe technique to characterize surface behavior. In this study, SR and WF of copper surfaces were measured using atomic force microscopy and scanning Kelvin probe, respectively. Experimental results showed that WF decreased with increase of SR. Using sine functions, a capacitor model was proposed and a correlation between WF and SR was established. The theoretical predictions of WF were in good agreement with experimental results. The model is also useful for analyzing the effect of tip geometry on measurements of WF. (C) 2005 American Institute of Physics.

引用

页数：6

共 28 条

[1]

Ashcroft N.W., 1976, Solid State Physics

[2] Multitip scanning bio-Kelvin probe [J].

Baikie, ID ;

Smith, PJS ;

Porterfield, DM ;

Estrup, PJ .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1999, 70 (03) :1842-1850

[3] Kelvin probe investigations of metal work functions and correlation to device performance of organic light-emitting devices [J].

Beierlein, TA ;

Brütting, W ;

Riel, H ;

Haskal, EI ;

Müller, P ;

Riess, W .

SYNTHETIC METALS, 2000, 111 :295-297

[4] Measurements and analysis of surface potential change during wear of single-crystal silicon (100) at ultralow loads using Kelvin probe microscopy [J].

Bhushan, B ;

Goldade, AV .

APPLIED SURFACE SCIENCE, 2000, 157 (04) :373-381

[5] Of a nanoscale Kelvin probe for detecting wear precursors [J].

DeVecchio, D ;

Bhushan, B .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (10) :3618-3624

[6] Simulation and correction of geometric distortions in scanning Kelvin probe microscopy [J].

Efimov, A ;

Cohen, SR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (04) :1051-1055

[7] Dynamic repulsion of surface steps during step flow etching: Controlling surface roughness with chemistry [J].

Huang, YC ;

Flidr, J ;

Newton, TA ;

Hines, MA .

JOURNAL OF CHEMICAL PHYSICS, 1998, 109 (12) :5025-5035

[8]

Hutchings I. M., 1992, TRIBOLOGY

[9] Characterisation of the properties of surface-treated indium-tin oxide thin films [J].

Kim, JS ;

Cacialli, F ;

Granström, M ;

Friend, RH ;

Johansson, N ;

Salaneck, WR ;

Daik, R ;

Feast, WJ .

SYNTHETIC METALS, 1999, 101 (1-3) :111-112

[10] THE EFFECT OF SURFACE TEXTURE ON FRICTION MECHANISMS [J].

KOURA, MM .

WEAR, 1980, 63 (01) :1-12

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