Recent Progress in Anti-Reflection Layer Fabrication for Solar Cells

被引：4

作者：

Sun, Hongwen ^{[1
]}

机构：

[1] Hohai Univ, Coll Internet Things, Changzhou 213022, Jiangsu, Peoples R China

来源：

JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS | 2016年 / 11卷 / 03期

关键词：

Anti-Reflection Layer (ARL); Anti-Reflection Coating (ARC); Solar Cells; Silicon; Photovoltaic (PV); Hydrogenated Silicon Nitride (SiNx:H); POWER CONVERSION EFFICIENCY; BROAD-BAND; SURFACES; REFLECTIVITY; ENHANCEMENT; PERFORMANCE; IMPROVEMENT;

D O I：

10.1166/jno.2016.1908

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Solar energy is an important sustainable future energy, and solar cells have drawn great research attention in recent years. The major problem in solar cells is low conversion efficiency. Therefore, many novel anti-reflection layers (ARL) have been researched and developed for different kinds of solar cells in recent years. Different anti-reflection (AR) materials and fabrication techniques are reviewed in detail for silicon (Si) monocrystalline solar cells, Si polycrystalline solar cells, thin-film solar cells, III-V and II-VI solar cells, nano solar cells, organic solar cells, and bio-mimetic solar cells.

引用

页码：257 / 264

页数：8

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