Quasistatic capacitance-voltage characteristics of plane-parallel structures:: Metal/semi-insulator/metal

被引:9
|
作者
Zdánsky, K [1 ]
机构
[1] Acad Sci Czech Republ, Inst Radio Engn & Elect, CR-18251 Prague 8, Czech Republic
关键词
D O I
10.1063/1.1305558
中图分类号
O59 [应用物理学];
学科分类号
摘要
Quasistatic capacitance-voltage characteristics of plane-parallel structures of the semi-insulating GaAs with two metal contacts are calculated numerically. The model of residual shallow acceptors compensated for by an excess of deep donors is used for the semi-insulating GaAs. Under consideration is the relaxation regime for the charge transport in the semi-insulator. We analyze metal/semi-insulator/metal structures for various parameters of the metal contacts and of the semi-insulator. It is shown that a negative capacitance can be obtained in some cases. A more detailed analysis is performed for the following structure: p-type like metal contact/n-type semi-insulator/n-type like metal contact. (C) 2000 American Institute of Physics. [S0021- 8979(00)01516-4].
引用
收藏
页码:2024 / 2029
页数:6
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