Quasistatic capacitance-voltage characteristics of plane-parallel structures:: Metal/semi-insulator/metal

被引:9
|
作者
Zdánsky, K [1 ]
机构
[1] Acad Sci Czech Republ, Inst Radio Engn & Elect, CR-18251 Prague 8, Czech Republic
关键词
D O I
10.1063/1.1305558
中图分类号
O59 [应用物理学];
学科分类号
摘要
Quasistatic capacitance-voltage characteristics of plane-parallel structures of the semi-insulating GaAs with two metal contacts are calculated numerically. The model of residual shallow acceptors compensated for by an excess of deep donors is used for the semi-insulating GaAs. Under consideration is the relaxation regime for the charge transport in the semi-insulator. We analyze metal/semi-insulator/metal structures for various parameters of the metal contacts and of the semi-insulator. It is shown that a negative capacitance can be obtained in some cases. A more detailed analysis is performed for the following structure: p-type like metal contact/n-type semi-insulator/n-type like metal contact. (C) 2000 American Institute of Physics. [S0021- 8979(00)01516-4].
引用
收藏
页码:2024 / 2029
页数:6
相关论文
共 50 条
  • [22] Capacitance-voltage characteristics of quantum well structures
    Moon, CR
    Lim, H
    Choe, BD
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1999, 34 : S77 - S80
  • [23] Capacitance-voltage characterization of polyfluorene-based metal-insulator-semiconductor diodes
    Yun, M.
    Ravindran, R.
    Hossain, M.
    Gangopadhyay, S.
    Scherf, U.
    Buennagel, T.
    Galbrecht, F.
    Arif, M.
    Guha, S.
    APPLIED PHYSICS LETTERS, 2006, 89 (01)
  • [24] The role of the HfO2-TiN interface in capacitance-voltage nonlinearity of Metal-Insulator-Metal capacitors
    Wenger, Ch.
    Lukosius, M.
    Weidner, G.
    Muessig, H. -J.
    Pasko, S.
    Lohe, Ch.
    THIN SOLID FILMS, 2009, 517 (23) : 6334 - 6336
  • [26] INFLUENCE OF FLUCTUATIONS OF THE BUILT-IN CHARGE ON THE CAPACITANCE-VOLTAGE CHARACTERISTICS OF METAL-INSULATOR-SEMICONDUCTOR STRUCTURES - NEGATIVE DENSITY OF SURFACE-STATES
    GERGEL, VA
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1979, 13 (04): : 385 - 387
  • [27] Detailed Investigation of GaN Metal-Insulator-Semiconductor Structures by Capacitance-Voltage and Deep Level Transient Spectroscopy Methods
    Kikawa, Junjiroh
    Horiuchi, Yuki
    Shibata, Eiji
    Kaneko, Masamitsu
    Otake, Hirotaka
    Fujishima, Tatsuya
    Chikamatsu, Kentaro
    Yamaguchi, Atsushi
    Nanishi, Yasushi
    PERFORMANCE AND RELIABILITY OF SEMICONDUCTOR DEVICES, 2009, 1108 : 157 - +
  • [28] Simulations of Capacitance-Voltage-Temperature Behavior of Metal/Insulator/AlGaN and Metal/Insulator/AlGaN/GaN Structures
    Miczek, Marcin
    Adamowicz, Boguslawa
    Mizue, Chihoko
    Hashizume, Tamotsu
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (04)
  • [29] Calculation of the capacitance-voltage characteristics of a metal-insulator-correlated oxide capacitor with dynamical mean-field theory
    Bakalov, Petar
    Ydens, Bart
    Locquet, Jean-Pierre
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2014, 211 (02): : 440 - 443
  • [30] Enhancement of the stability of capacitance-voltage characteristics of Hg1-xZnxTe-based metal-insulator-semiconductor capacitors by voltage annealing
    Kim, YH
    Kim, SH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (10A): : L1244 - L1246