Rapid thermal annealing of tungsten silicide films

被引：0
|
作者：
Fabricius, A [1 ]
Nennewitz, O [1 ]
Spiess, L [1 ]
Cimalla, V [1 ]
Pezoldt, J [1 ]
机构：
[1] TECH UNIV ILMENAU,INST WERKSTOFFE,D-98684 ILMENAU,GERMANY
来源：
SILICIDE THIN FILMS - FABRICATION, PROPERTIES, AND APPLICATIONS | 1996年 / 402卷
关键词：
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：625 / 630
页数：6
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