Thin films of Au-Al2O3 for plasmonic sensing

被引:16
作者
Meira, Diana, I [1 ]
Domingues, Rui P. [1 ]
Rodrigues, Marco S. [1 ]
Alves, Eduardo [2 ]
Barradas, Nuno P. [3 ]
Borges, Joel [1 ]
Vaz, Filipe [1 ]
机构
[1] Univ Minho, Ctr Fis, Campus Gualtar, P-4710057 Braga, Portugal
[2] Univ Lisbon, Inst Super Tecn, Inst Plasmas & Fusao Nucl, Lab Aceleradores & Tecnol Radiacao, Estr Natl 10,Km 139,7, P-2695066 Bobadela, Portugal
[3] Univ Lisbon, Inst Super Tecn, Ctr Ciencias & Tecnol Nucl, P-2695066 Bobadela, Portugal
关键词
Thin films; Magnetron sputtering; Localized surface plasmon resonance; Au nanoparticles; Al2O3; matrix; Plasmonic sensing; GOLD NANOPARTICLES; METAL NANOPARTICLES; NANOCOMPOSITE FILMS; GAS SENSORS; HOST MATRIX; SURFACE; AU; RESONANCE; SENSITIVITY; AG;
D O I
10.1016/j.apsusc.2019.144035
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This works reports on the development of nanoplasmonic thin films, composed of Au nanoparticles embedded in an Al2O3 matrix. The Au-Al2O3 thin films were deposited by magnetron sputtering, and then subjected to thermal treatments (in-air) to promote the growth of the Au nanoparticles. The change of the number of gold pellets placed in the erosion zone of the aluminium target, originated Au concentrations in the films from 8.9 at.% to 20.7 at.%. While the Al2O3 matrix remained roughly stoichiometric and amorphous after the thermal treatment, a progressive crystallization of the Au nanoparticles was observed when the annealing temperature increased from 400 degrees C to 700 degrees C. Nonetheless, the amorphous matrix limited the growth of Au nanoparticles up to 20 nm. Moreover, the application of an argon plasma treatment enabled the removal of superficial layers, increasing the density of Au nanoparticles partially exposed at the films' surface. Envisaging the application in localized surface plasmon resonance sensors, the thin films were tested using two dielectric (liquid) environments, showing a consistent response under different H2O/DMSO cycles, yet with low sensitivities (few nm/RIU). To enhance the sensitivity of these thin film system other strategies are discussed.
引用
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页数:11
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