Ar plasma treatment on few layer graphene sheets for enhancing their field emission properties

被引：74

作者：

Qi, J. L.

Wang, X.

Zheng, W. T. ^{[1
]}

Tian, H. W.

Hu, C. Q.

Peng, Y. S.

机构：

[1] Jilin Univ, MOE, Key Lab Mobile Mat, Dept Mat Sci, Changchun 130012, Peoples R China

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2010年 / 43卷 / 05期

基金：

中国国家自然科学基金;

关键词：

CARBON NANOTUBES;

D O I：

10.1088/0022-3727/43/5/055302

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Plasma treatment in Ar gas on few layer graphene sheets (FLGSs), synthesized by plasma enhanced chemical vapour deposition, has been performed for enhancing their field emission properties. The plasma etching treatment for 3 min on the FLGSs, forming an extremely sharp edge, decreases the turn-on electric field from 3.91 to 2.23V mu m(-1), and increases the maximum emission current density, drawn at a field of 4.4 V mu m(-1), from 33 to 1330 mu A cm(-2). It is expected that plasma treatment provides an efficient way to improve the field emission properties of FLGSs.

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页数：6

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