Silicon-based wire electrode array for neural interfaces

Objectives. Metal-wire electrode arrays are widely used to record and stimulate neurons. Commonly, these devices are fabricated from a long insulated metal wire by cutting it into the proper length and using the cross-section as the electrode site. The assembly of a micro-wire electrode array with regular spacing is difficult. With the help of micro-machine technology, a silicon-based wire electrode array (SWEA) is proposed to simplify the assembling process and provide a wire-type electrode with tapered tips. Approach. Silicon wires with regular spacing coated with metal are generated from a silicon wafer through micro-fabrication and are ordered into a 3D array. A silicon wafer is cut into a comb-like structure with hexagonal teeth on both sides by anisotropic etching. To establish an array of silicon-based linear needles through isotropic wet etching, the diameters of these hexagonal teeth are reduced; their sharp edges are smoothed out and their tips are sharpened. The needle array is coated with a layer of parylene after metallization. The tips of the needles are then exposed to form an array of linear neural electrodes. With these linear electrode arrays, an array of area electrodes can be fabricated. Main results. A 6 x 6 array of wire-type electrodes based on silicon is developed using this method. The time required to manually assemble the 3D array decreases significantly with the introduction of micro-fabricated 2D array. Meanwhile, the tip intervals in the 2D array are accurate and are controlled at no more than 1%. The SWEA is effective both in vitro and in vivo. Significance. Using this method, the SWEA can be batch-prepared in advance along with its parameters, such as spacing, length, and diameter. Thus, neural scientists can assemble proper electrode arrays in a short time.