An atomic interaction-based continuum model for adhesive contact mechanics

被引:68
|
作者
Sauer, Roger A. [1 ]
Li, Shaofan [1 ]
机构
[1] Univ Calif Berkeley, Dept Civil & Environm Engn, Berkeley, CA 94720 USA
基金
美国国家科学基金会;
关键词
adhesive contact; computational contact mechanics; continuum mechanics; interatomic potential; JKR theory; nano-mechanics; scaling;
D O I
10.1016/j.finel.2006.11.009
中图分类号
O29 [应用数学];
学科分类号
070104 ;
摘要
A micro/nano-scale computational contact mechanics model is proposed to study the adhesive contact between deformable bodies. To model adhesive contact, an interatomic interaction potential is incorporated into the framework of nonlinear continuum mechanics. The ensuing contact model is cast into an efficient finite element formulation which is implemented using an updated Lagrangian approach. The scaling of the model with respect to its geometrical size and the strength of adhesion is investigated. The proposed computational contact model is validated by a comparison with the analytical JKR and Maugis-Dugdale models. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:384 / 396
页数:13
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