Influence of O2 flow rate on the characteristics of TiO2 thin films deposited by RF reactive sputtering

被引：10

作者：

Kamble, Sudhir S. ^{[1
]}

Radhakrishnan, J. K. ^{[1
]}

机构：

[1] DRDO, Def Bioengn & Electromed Lab, Bangalore 560093, Karnataka, India

来源：

MATERIALS TODAY-PROCEEDINGS | 2021年 / 45卷

关键词：

TiO2 thin film; Reactive sputtering; O-2-flow rate; OXYGEN PARTIAL-PRESSURE; OPTICAL-PROPERTIES; PHOTOLUMINESCENCE; NANOPARTICLES; GROWTH; PROPERTY; PLASMA;

D O I：

10.1016/j.matpr.2020.07.405

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium dioxide (TiO2) thin films were prepared by radio-frequency (13.56 MHz) reactive sputtering onto glass substrate with different oxygen flow rates while maintaining a constant Ar flow rate. The structural and optical properties of these films were studied with variation in O-2 flow rate. X-ray diffraction (XRD) analysis of these films reveals the presence of anatase and rutile phases. The lattice parameters and crystallite size were evaluated from XRD patterns. The optical properties of these films were correlated with their morphological nature. Field emission scanning electron microscopy (FESEM) results show a dense granular morphology and the particle size is found to decrease with increase in oxygen flow rate. The average optical transmittance was observed to be 96% for all the films. The room temperature photoluminescence (PL) spectroscopy revealed a blue shift of the near band edge emission as the oxygen flow rate is increased and defect related emissions is shifted towards red region. (C) 2019 Elsevier Ltd. All rights reserved.

引用

页码：3915 / 3919

页数：5

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