High-power ion beam sources for industrial application

Two sources of high-power ion beams of nanosecond duration are described, a MUK and a TEMP unit. They generated ions with energies of up to 150 and 300 keV, respectively, and the pulse duration was 20-200 and 50 ns, respectively. For the MUK unit, beam parameters for heavy ion implantation (Aln+, Mgn+, Fen+, Wn+, etc.) were as follows: current density ranging from 1 to 10 A cm(-2) and total ion flux energy up to 20 J. For the TEMP unit, the following beam parameters were used for H+ and Cn+ ions: current density 40-200 A cm(-2) and total ion flux energy 0.3-0.5 kJ. The sources are powered by various diode systems and can be applied in material science for scientific research and technology. (C) 1997 Elsevier Science S.A.