Approaching routine 2π/1000 phase resolution for off-axis type holography

被引:47
作者
Voelkl, Edgar [1 ]
Tang, Dong [2 ]
机构
[1] FEI Co, Hillsboro, OR 97124 USA
[2] FEI Co, NL-5651 GG Eindhoven, Netherlands
关键词
Off-axis holography; Phase noise; Amplitude noise; Phase resolution; Sampling rate; ELECTRON HOLOGRAPHY; CCD CAMERAS; PERFORMANCE; LIMITS;
D O I
10.1016/j.ultramic.2009.11.017
中图分类号
TH742 [显微镜];
学科分类号
摘要
Off-axis type holography as introduced by Mollenstedt for electron optics and by Leith et al. for light optics is based on the same principles. The general perception is that holography with light has a distinct advantage over electron holography simply because of the much higher brightness of the laser over any known electron source. However, light-optical elements introduce diffuse scattering within each optical element and back-reflection on each surface even in the most advanced optical systems. Thus light-optical phase resolution is limited by these parameters. Not so in electron optics where its optical elements introduce neither diffuse scattering nor back-reflections as the electron beam remains in vacuum. Thus the question what ultimately limits the phase resolution for off-axis electron holography apart from sample sensitivity to radiation damage is an important question to be asked. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:447 / 459
页数:13
相关论文
共 29 条
[1]  
Allard L.F., 1999, INTRO ELECT HOLOGRAP
[2]  
[Anonymous], DIGITALMICROGRAPH
[3]   Medium resolution off-axis electron holography with millivolt sensitivity [J].
Cooper, David ;
Truche, Robert ;
Rivallin, Pierrette ;
Hartmann, Jean-Michel ;
Laugier, Frederic ;
Bertin, Francois ;
Chabli, Amal ;
Rouviere, Jean-Luc .
APPLIED PHYSICS LETTERS, 2007, 91 (14)
[4]   PERFORMANCE OF ELECTRON IMAGE CONVERTERS WITH YAG SINGLE-CRYSTAL SCREEN AND CCD SENSOR [J].
DABERKOW, I ;
HERRMANN, KH ;
LIU, LB ;
RAU, WD .
ULTRAMICROSCOPY, 1991, 38 (3-4) :215-223
[5]   METHODS TO MEASURE PROPERTIES OF SLOW-SCAN CCD CAMERAS FOR ELECTRON DETECTION [J].
DERUIJTER, WJ ;
WEISS, JK .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1992, 63 (10) :4314-4321
[6]  
DERUIJTER WJ, 1994, MSA B, V24, P451
[7]   Characterization of the holography performance of a Titan 80-300 with high brightness Schottky electron gun and image Cs-corrector at 300kV acceleration voltage [J].
Freitag, B. ;
Kujawa, S. ;
Linck, M. ;
Geiger, D. ;
Niermann, T. ;
Lehmann, M. ;
Lichte, H. .
MICROSCOPY AND MICROANALYSIS, 2009, 15 :1098-1099
[8]   CORRECTION OF ABERRATIONS OF AN ELECTRON-MICROSCOPE BY MEANS OF ELECTRON HOLOGRAPHY [J].
FU, Q ;
LICHTE, H ;
VOLKL, E .
PHYSICAL REVIEW LETTERS, 1991, 67 (17) :2319-2322
[9]  
*GAT INC, SOFTW HOLOWORKS
[10]   Prerequisites for a Cc/Cs-corrected ultrahigh-resolution TEM [J].
Haider, M. ;
Mueller, H. ;
Uhlemann, S. ;
Zach, J. ;
Loebau, U. ;
Hoeschen, R. .
ULTRAMICROSCOPY, 2008, 108 (03) :167-178