SiTe monolayers: Si-based analogues of phosphorene

被引:56
作者
Chen, Yu [1 ]
Sun, Qiang [1 ,2 ,3 ]
Jena, Puru [3 ]
机构
[1] Peking Univ, Dept Mat Sci & Engn, Beijing 100871, Peoples R China
[2] Peking Univ, Ctr Appl Phys & Technol, Beijing 100871, Peoples R China
[3] Virginia Commonwealth Univ, Dept Phys, Richmond, VA 23284 USA
基金
中国国家自然科学基金;
关键词
POISSONS RATIO; SNSE; NANOSHEETS; GES;
D O I
10.1039/c6tc01138a
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Complementing the group of two-dimensional (2D) binary phosphorene analogues, we carried out first-principles calculations for alpha-SiTe and beta-SiTe monolayers which are, respectively, black-phosphorene-like and blue-phosphorene-like. We show that both the SiTe monolayers are dynamically, thermally and mechanically stable, although alpha-SiTe with significant elastic anisotropy is energetically more favorable than beta-SiTe. Both monolayers exhibit superior mechanical flexibility and are indirect-gap semiconductors with band gaps of 0.57 and 2.36 eV, respectively. What is even more important is that the alpha-SiTe monolayer can be tuned from an indirect band gap semiconductor to a direct band gap semiconductor and eventually to a metal when biaxial strains are applied, showing a high degree of flexibility in band engineering which is absent in non-silicon based analogues.
引用
收藏
页码:6353 / 6361
页数:9
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