Fabrication of Artificial Periodic Defects in Colloidal Photonic Crystals by Photolithography

被引:0
|
作者
Zhao, Yong Qiang [1 ]
Zhi, Yu Song
Li, Chao Rong
Zhang, Xiao Bo
机构
[1] Zhejiang Sci Tech Univ, Ctr Optoelect Mat, Dept Phys, Hangzhou 310018, Zhejiang, Peoples R China
来源
MATERIALS SCIENCE AND PROCESSING, ENVIRONMENTAL ENGINEERING AND INFORMATION TECHNOLOGIES | 2014年 / 665卷
基金
中国国家自然科学基金;
关键词
artificial periodic defects; colloidal photonic crystals; blue shift; EXTRINSIC DEFECTS;
D O I
10.4028/www.scientific.net/AMM.665.99
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
We introduce artificial periodic defects with required size in colloidal photonic crystals by a simple and inexpensive photolithography. The morphology of colloidal photonic crystals with defects is observed by field emission scanning electron microscope (SEM) and optical properties by UV-VIS spectra. We find that the periodic photoresist strips will cause a blue shift and the shift value depends on the the size of periodic photoresist strips.
引用
收藏
页码:99 / 101
页数:3
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