Threshold energy for the photon-stimulated desorption of Rb atoms from polydimethylsiloxane films

被引:2
作者
Bernheim, RA [1 ]
Xu, JH
Mango, F
Alzetta, G
机构
[1] Penn State Univ, Dept Chem, Davey Lab 152, University Pk, PA 16802 USA
[2] Scuola Normale Super Pisa, I-56100 Pisa, Italy
[3] Inst Nazl Fis Mat, I-56100 Pisa, Italy
[4] INFM, UDR Pisa, I-56127 Pisa, Italy
[5] Dipartimento Fis, I-56127 Pisa, Italy
基金
美国国家科学基金会;
关键词
D O I
10.1016/S0009-2614(00)01238-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The laser frequency dependence of the photon-stimulated desorption (PSD) of Rb atoms from surfaces prepared by adsorption of rubidium vapor on thin films of polydimethylsiloxane (PDMS) was determined at low light intensities and at room temperature to have a threshold energy of 11 100 cm(-1). The desorption of Rb follows the same functional dependence on laser frequency and intensity as that found for Na and Na-2, where thresholds of 9500 and 11 500 cm(-1) were determined, respectively, and where a charge transfer model for the adsorbed species could successfully explain the 2000 cm(-1) difference in energy thresholds. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1 / 4
页数:4
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