Electrical and Optical Testing System for Microplasma in Scanning Plasma Etching

被引：0

作者：

Xiang, Weiwei ^{[1
]}

Wen, Li ^{[1
]}

Wang, Hai ^{[2
]}

Zhang, Qiuping ^{[1
]}

Chu, Jiaru ^{[1
]}

机构：

[1] Univ Sci & Technol China, Dept Precis Machinery & Precis Instrumentat, Hefei 230026, Peoples R China

[2] Anhui Univ Technol & Sci, Dept Engn Mech, Wuhan, Peoples R China

来源：

2009 4TH IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEMS, VOLS 1 AND 2 | 2009年

基金：

中国国家自然科学基金;

关键词：

electrical; microplasma; optical; testing; system;

D O I：

10.1109/NEMS.2009.5068645

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In scanning plasma etching process, characteristic parameters of microplasma are the most important influencing factors. Based on the fundamental principle of microplasma etching and the device we fabricated, a set of electrical and optical testing system for our microplasma device was presented in this paper. The electrical and optical signals were collected in the vacuum chamber, then exported to the outside and connected to the testing circuit and optical spectrum analyzer separately. At last, some primary experiment results were given which proved the feasibility and effectivity of this system.

引用

页码：572 / +

页数：2