Continuous formation and faceting of SiGe islands on Si(100)

被引:32
作者
Sutter, P [1 ]
Zahl, P [1 ]
Sutter, E [1 ]
机构
[1] Colorado Sch Mines, Dept Phys, Golden, CO 80401 USA
关键词
D O I
10.1063/1.1577386
中图分类号
O59 [应用物理学];
学科分类号
摘要
The multiscale mechanisms leading to the formation of faceted quantum dot (QD) islands during Si1-xGex/Si(100) heteroepitaxy were studied by scanning tunneling microscopy. The entire evolution from an initial morphological instability of the strained alloy to final {105} faceted pyramidal QD islands is continuous. Shallow mounds, generated by the alloy instability, are bounded by alternating (100) terraces and single-layer steps. Growth of the mounds in height without lateral expansion drives a continuous increase in mound slope and step density up to a critical angle of about 6degrees. Kinetic constraints then force the nucleation of small {105} protofacets, which expand and ultimately coalesce to form the {105} facets bounding pyramidal QD islands. (C) 2003 American Institute of Physics.
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页码:3454 / 3456
页数:3
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