Patterning spherical surfaces at the two-hundred-nanometer scale using soft lithography

被引：80
作者：
Paul, KE [1 ]
Prentiss, M
Whitesides, GM
机构：
[1] Harvard Univ, Dept Chem & Chem Biol, Cambridge, MA 02138 USA
[2] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
来源：
ADVANCED FUNCTIONAL MATERIALS | 2003年 / 13卷 / 04期
关键词：
D O I：
10.1002/adfm.200304255
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Two soft lithographic techniques-topographically directed photolithography (TOP) and near-field contact-mode photolithograph-have been used to pattern spherical surfaces with features as small as 175 nm. Each technique has the ability to pattern more than a 60degrees arc of a spherical surface, albeit with distortions at the edge. Use as an optical polarizer demonstrates an application of these types of patterned surface.
引用
收藏
页码：259 / 263
页数：5
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