Assessment of High-Frequency Performance Limit of Black Phosphorus Field-Effect Transistors

被引:17
作者
Yin, Demin [1 ]
AlMutairi, AbdulAziz [1 ]
Yoon, Youngki [1 ]
机构
[1] Univ Waterloo, Dept Elect & Comp Engn, Waterloo Inst Nanotechnol, Waterloo, ON N2L 3G1, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
Black phosphorus; cutoff frequency; field-effect transistor (FET); nonequilibrium Green's function (NEGF); small-signal circuit model; unity power gain frequency; GRAPHENE TRANSISTORS; CONTACT RESISTANCE; ELECTRON-MOBILITY; TRANSPORT; ANISOTROPY;
D O I
10.1109/TED.2017.2699969
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Recently, gigahertz frequencies have been reported with black phosphorus (BP) field-effect transistors (FETs), yet the high-frequency performance limit has remained unexplored. Here we project the frequency limit of BP FETs based on rigorous atomistic quantum transport simulations and the small-signal circuit model. Our self-consistent nonequilibrium Green's function (NEGF) simulation results show that semiconducting BP FETs exhibit clear saturation behaviors with the drain voltage, unlike zero-bandgap graphene devices, leading to > 10 THz frequencies for both intrinsic cutoff frequency (f(T)) and unity power gain frequency (f(max)). To develop keen insight into practical devices, we discuss the optimization of f(T) and f(max) by varying various device parameters such as channel length (L-ch), oxide thickness, device width, gate resistance, contact resistance, and parasitic capacitance. Although extrinsic f(T) and f(max) can be significantly affected by the contact resistance and parasitic capacitance, they can remain near THz frequency range (f(T) = 900 GHz; f(max) = 1.2 THz) through proper engineering, particularly with an aggressive channel length scaling (L-ch approximate to 10 nm). Our benchmark against the experimental data indicates that there still exists large room for optimization in fabrication, suggesting further advancement of high-frequency performance of state-of-the-art-BP FETs for the future analog and radio-frequency applications.
引用
收藏
页码:2984 / 2991
页数:8
相关论文
共 47 条
[1]  
[Anonymous], 1999, FUNDAMENTALS 3 5 DEV
[2]  
[Anonymous], IEEE INT EL DEV M
[3]   Effects of electron confinement on thermionic emission current in a modulation doped heterostructure [J].
Anwar, A ;
Nabet, B ;
Culp, J ;
Castro, F .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (05) :2663-2666
[4]   Ultrahigh electron mobility in suspended graphene [J].
Bolotin, K. I. ;
Sikes, K. J. ;
Jiang, Z. ;
Klima, M. ;
Fudenberg, G. ;
Hone, J. ;
Kim, P. ;
Stormer, H. L. .
SOLID STATE COMMUNICATIONS, 2008, 146 (9-10) :351-355
[5]   InAs Thin-Channel High-Electron-Mobility Transistors with Very High Current-Gain Cutoff Frequency for Emerging Submillimeter-Wave Applications [J].
Chang, Edward-Yi ;
Kuo, Chien-I ;
Hsu, Heng-Tung ;
Chiang, Che-Yang ;
Miyamoto, Yasuyuki .
APPLIED PHYSICS EXPRESS, 2013, 6 (03)
[6]   A computational study of high-frequency behavior of graphene field-effect transistors [J].
Chauhan, Jyotsna ;
Liu, Leitao ;
Lu, Yang ;
Guo, Jing .
JOURNAL OF APPLIED PHYSICS, 2012, 111 (09)
[7]   Assessment of high-frequency performance limits of graphene field-effect transistors [J].
Chauhan, Jyotsna ;
Guo, Jing .
NANO RESEARCH, 2011, 4 (06) :571-579
[8]   High-frequency self-aligned graphene transistors with transferred gate stacks [J].
Cheng, Rui ;
Bai, Jingwei ;
Liao, Lei ;
Zhou, Hailong ;
Chen, Yu ;
Liu, Lixin ;
Lin, Yung-Chen ;
Jiang, Shan ;
Huang, Yu ;
Duan, Xiangfeng .
PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, 2012, 109 (29) :11588-11592
[9]   What are the limiting parameters of deep-submicron MOSFETs for high frequency applications? [J].
Dambrine, G ;
Raynaud, C ;
Lederer, D ;
Dehan, M ;
Rozeaux, O ;
Vanmackelberg, M ;
Danneville, F ;
Lepilliet, S ;
Raskin, JP .
IEEE ELECTRON DEVICE LETTERS, 2003, 24 (03) :189-191
[10]  
Datta S., 2013, Quantum Transport: atom to Transistor